Abstract
Undoped and aluminum-doped zinc oxide (ZnO:Al) thin films were prepared on heated Corning 7059 glass substrates by the pyrosol method under various deposition conditions. The effects of the different deposition variables and the annealing conditions in vacuum were investigated by analyzing the electrical, optical, morphological, and compositional changes of the films. The results indicated that it was possible to obtain ZnO:Al films with a transmittance of about 80% and a resistivity as low as $3.5{\times}10^{-3}{\Omega}{\cot}$cm. Furthermore, it was also found that the films were stable in a hydrogen plasma atmosphere within an exposure time of 10 minutes.