Journal of the Korean Institute of Electrical and Electronic Material Engineers (한국전기전자재료학회논문지)

The Korean Institute of Electrical and Electronic Material Engineers (한국전기전자재료학회)
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Field Electron Emission from Amorphous Carbon Thin Film Grown Using Rf Magnetron Sputtering Method

RF 마그네트론 스퍼터링법으로 성장된 Amorphous carbon 각막의 전계전자방출

  • ;
  • ;
  • K. Oura
  • 김연보 (대구대학교 정보통신공학부) ;
  • 류정탁 (대구대학교 정보통신공학부) ;
  • Published : 2001.03.01
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Abstract

Using RF magnetron sputtering, amorphous carbon(a-C) thin films as electron filed emitter were fabricated. these a-C thin films were deposited on Si(001) substrate at several temperatures. The field electron emission property of these a-C thin films was estimated by a diode technique. As the result, we observed that the field emission properties of the films were changed singnificantly with the substrate temperature and structural features of a-C film. The field emission properties were promoted by higher substrate temperatures. Furthermore N-doped a-C film exhibits more field emission property than that of undoped a-C film. These results are explained as change of surface morphology and structural properties of a-C film.

Keywords

References

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