Abstract
Preparation of $TiO_2$ films having superior optical and structural characteristics was attempted using a conventional rf magnetron sputtering by modifying deposition variables, such as the substrate temperature and the gas composition in the sputtering ambient. $TiO_2$ films grown without $O_2$ addition showed considerable optical loss due to the optical absorption by an oxygen deficiency in the film and the scattering by large surface roughness. However, $TiO_2$ films grown with $O_2$ addition had a stoichiometric composition and a smooth surface morphology without optical loss. Substrate heating during deposition enhanced the packing density and crystallinity of the film, and as a result, $TiO_2$ films with higher refractive index and better homogeneity could be obtained with substrate heating between $200^{\circ}C$ and $400^{\circ}C$.