Journal of the Korean Institute of Electrical and Electronic Material Engineers (한국전기전자재료학회논문지)

The Korean Institute of Electrical and Electronic Material Engineers (한국전기전자재료학회)
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Influence of a Magnetic Field on High voltage Discharge Plasma Area for Carbon Nitride Film Deposition

질환탄소 박막 증착 시 고전압 방전 플라즈마에 가한 자장의 영향

  • 김종일 (한국기술교육대학교 정보기술공학부) ;
  • 배선기 (인천대학교 전기공학과)
  • Published : 2002.02.01
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Abstract

Carbon nitride films were grown on Si (100) substrate by a laser-electric discharge method with/without a magnetic field assistance. The magnetic field leads to vapor plume plasma expending upon the ambient arc discharge plasma area. Influence of the magnetic field has resulted in increased of a crystallite size int he films due to bombardment (heating) of Si substrates by energetic carbon and nitrogen species generated during cyclotron motion of electrons in the discharge zone. The surface morphology of the films with a deposition time of 2 hours was studied using a scanning electron microscopy (SEM). In order to determine the structural crystalline parameters, X-ray diffraction (XRD) was used to analysis the grown films.

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