Journal of the Korean Society for Precision Engineering (한국정밀공학회지)

Korean Society for Precision Engineering (한국정밀공학회)
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Optimization of Laser Lithography Micropatterning Technique based on Taguchi Method

다구찌 방법을 이용한 레이저 리소그라피 미세패턴 가공조건의 최적화

  • Baek, Nam-Guk (Dept.of Mechanical Engineering, Graduate School of Yonsei University) ;
  • Kim, Dae-Eun (Dept.of Mechanical Engineering, Yonsei University)
  • 백남국 (연세대학교 기계공학과 대학원) ;
  • 김대은 (연세대학교 기계공학부)
  • Published : 2002.07.01
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Abstract

Laser lithography technique is useful for fabricating micro-patterns of silicon wafers. In this work, the laser lithography micromachining technique is optimized based on Taguchi method. Sensitivity analysis was performed using laser scanning speed, laser power level, developing time and mixture ratio between developer and Di-water as the parameters. The results show that for the photoresist used in this work, 70${\mu}m$/s scan speed, 50㎽ laser power, 60sec. developing time and 6: 1 mixture ratio gives the best result. This work shows the effectiveness of laser lithography technique in fabricating patterns with a flew micrometer in width.

Keywords

References

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