Korean Chemical Engineering Research

The Korean Institute of Chemical Engineers (한국화학공학회)
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New Unconventional Nanolithographic Methods

새로운 비전통적 나노리소그라피 공정

Yu, Pil Jin;Lee, Sang Hun;Park, Mi Gyeong;Gwon, Seok Jun;Gang, Hye Won;Lee, Hong Hui
유필진;이상훈;박미경;권석준;강혜원;이홍희

  • Published : 20030000
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Abstract

This review is on unconventional nanolithographies that can replace the conventional photolithography. All these techniques utilize a patterned mold and the patterning is realized by physical contact of the mold with the underlying polymer layer. They are cost-effective, applicable to small feature sizes that cannot be defined by photolithography, and to an extentapplicable to non-planar surfaces. Imprint and soft lithographies are reviewed first, which is then followed by new lithographies of room-temperature imprint lithography, capillary force lithography and soft molding. These new techniques are also efficient and cost-effective in fabricating complex or three-dimensional patterns and structures.

본 총설에서는 나노 형상 및 나노 구조체의 제작에 있어서 기존의 노광 공정을 이용하는 대신, 물리적 접촉법을 통해서 형상을 구현하는 비전통적 패터닝 방법을 소개하였다. 이에 기존 노광 공정의 비용 및 기술적 문제를 극복하는 대안으로써 나노 각인 리소그라피법과 연성 리소그라피법을 제시하였다. 이들 공정은 주형을 이용하여 반복적으로 형상을 구현함으로써 경제적인 공정을 구현하면서도, 곡면상에의 형상 구현까지도 가능한 기술적 장점을 가지고 있다. 더 나아가, 이들 공정의 단점을 보완함과 동시에 산업적 이용가치를 높인 공정으로써 상온 각인 리소그라피법, 모세관력 리소그라피법 및 연성 성형법을 제시하였다. 이를 통해 간단한 공정만으로도 복잡한 구조나 3차원 구조의 나노 형상을 자유로이 제조할 수 있었다.

Keywords

References

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