Korean Journal of Materials Research (한국재료학회지)

Materials Research Society of Korea (한국재료학회)
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The Fabrication of Hydroxyapatite Targets and the Characteristics of Hydroxyapatite/Ti-6Al-4V Alloy Thin Films by RF Sputtering(I)

RF 스퍼터링용 Hydroxyapatite 타겟의 제조 및 Hydroxyapatite/Ti-6Al-4V 합금 박막의 특성(I)

  • Jung, Chan-Hoi (Dept. of Materials Engineering, Chungbuk National University) ;
  • Kim, Myung-Han (Dept. of Materials Engineering, Chungbuk National University)
  • 정찬회 (충북대학교 재료공학과) ;
  • 김명한 (충북대학교 재료공학과)
  • Published : 2003.04.01
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Abstract

RF sputtering process was applied to produce thin hydroxyapatite［HA, Ca10($PO_4$)$_{6}$ $ (OH)_2$films on Ti-6Al-4V alloy substrates. To make a 101.6 mm dia.${\times}$5 mm HA target, the commercial HA powder was first calcinated for 3h at $200^{\circ}C$. A certain amount of the calcinated HA powder was pressed under a pressure of 20,000 psi by the cold isostatic press(CIP) and the pressed HA target was sintered for 6 h at $1,200^{\circ}C$. The effects of different heat treating conditions on the bonding strength between HA thin films and Ti-6Al-4V alloy substrates were studied. Before deposition, the alloy substrates were annealed for 1 h at $850^{\circ}C$ under $3.0${\times}$10^{-3}$ Xtorr, and after deposition, the hydroxyapatite/Ti-6Al-4V alloy thin films were annealed for 1 h at 400, 600 and $800^{\circ}C$ under the atmosphere, respectively. Experimental results represented that the HA thin films on the annealed substrates had higher hardness than non-heat treated substrates before the deposition.

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  1. The Heat Treatment Characteristics of Hydroxyapatite Thin Films Deposited by RF Sputtering vol.124-126, pp.1662-9779, 2007, https://doi.org/10.4028/www.scientific.net/SSP.124-126.1433