Measurement Technology of Chamber Impedance for RF Matching

RF 정합 특성 개선을 위한 챔버의 임피던스 측정법

  • 설용태 (호서대학교 전기정보통신제어공학부) ;
  • 이의용 (호서대학교 전기정보통신제어공학부) ;
  • 박성진 (호서대학교 전기정보통신제어공학부)
  • Published : 2003.12.01

Abstract

An adaptor is designed for chamber impedance measurement of plasma process. Copper rod, fixed board and compensation circuit are the major components of the adaptor. An adaptor can be to measure chamber impedance on time unless stopping a process and Data to measure can do the database. We can use it to a criteria data for a failure diagnosis. So developed adaptor could be used for diagnosis the plasma process chamber in semiconductor industry.

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