Applied Chemistry for Engineering (공업화학)

The Korean Society of Industrial and Engineering Chemistry (한국공업화학회)
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Characterization of Al Thin Films Prepared by Sputtering

Sputtering법에 의하여 형성된 Al 박막의 특성 평가

Moon, Myung-Jun;Lee, Jung-Mu;Jeon, Jong-Tak;Jung, Bong-Kue;Lee, Gun-Dae
문명준;이종무;전종탁;정봉규;이근대

  • Published : 20040600
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Abstract

Reflective Al thin films were prepared by sputtering. The effects of deposition conditions and substrates on the reflectivity of Al thin films were investigated. The reflectivity of Al thin film increased with decreasing deposition pressure. Within the range of $100{\sim}400\;W$ of RF power, the highest reflectivity was obtained at 200 W. The Al thin film deposited on the glass substrate showed higher reflectivity than that on polycarbonate; this may be due to the lower thermal expansion coefficient of glass. It was found from the observation of Al film using atomic force microscopy that the reflectivity of Al thin film increased with increasing grain size and decreasing surface roughness. From the result of X-ray diffraction measurements, it was shown that the peak intensity of (111) phase in Al film increased with lowering chamber pressure, leading to increased reflectivity.

Sputtering법을 이용하여 반사형 Al 박막을 제조하였다. 이 때 증착조건 및 사용된 기판이 Al의 반사율에 미치는 영향을 조사하였다. Al의 반사율은 증착압력이 낮을수록 증가하였다. 그리고 증착파워 $100{\sim}400\;W$ 범위에서는 200 W 일 때가 가장 큰 반사율을 나타내었다. 유리 기판의 경우가 polycarbonate 기판에 비해 우수한 반사율을 보였으며, 이는 유리의 낮은 열팽창계수에 기인한 것으로 생각된다. AFM을 이용한 Al박막의 관찰로부터 결정립의 크기가 크고, 표면 거칠기가 낮을수록 반사율이 높은 것으로 알 수 있었다. X-선 회절분석 결과, 가스압력이 낮을수록 Al의 (111) 면의 피크강도가 증가함을 볼 수 있었고, 이 경우 반사율이 증가함을 알 수 있었다.

Keywords

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