Korean Journal of Metals and Materials (대한금속재료학회지)

The Korean Institute of Metals and Materials (대한금속재료학회)
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Characterization of ZnO:Al Transparent Conduction Films produced by DC Magnetron Sputtering Method

DC 마그네트론 스퍼터법으로 제조한 ZnO:Al 투명 전도막의 특성

Lee, Se-Jong;Yoon, Hyon-Woo;Kim, Byung-Sub;Lee, Sung-Uk;Park, Min-Woo;Kwak, Dong-Joo
이세종;윤현우;김병섭;이성욱;박민우;곽동주

  • Published : 2004.09.20
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Abstract

Sputter-deposited Al-doped zinc oxide (ZnO:Al) is an attractive transparent conductive oxide material for application as transparent electrode in various electronic devices. In this work, the ZnO:Al films are prepared by the capacitively couped DC magnetron sputtering on glass substrates and the influence of the substrate temperature and working gas pressure on the electrical, optical and morphological properties are investigated. We find that the ZnO:Al film with the optimum deposition parameters shows the resistivity of $0.96{\times}10^{-3}\;{\Omega}cm$ and the transmittance of average 90% in the wavelength range of the visible spectrum.

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References

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