Journal of the Korean Physical Society

Korean Physical Society (한국물리학회)
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Characteristics of $CF_x$ Radicals and Plasma Parameters in an Inductively Coupled $CF_4$ Plasma

Kim, Jung-Hyung;Chung, Kwang-Hwa;Yoo, Yong-Shim

  • Published : 20050800
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Abstract

The behaviors of $CF_x$ radicals were studied in a $CF_4$ inductively coupled plasma. We investigated the change in the electron density by using the plasma frequency with the wave cutoff method and the behavior of $CF_2$ radical by using a laser-induced fluorescence method. We used the rate equations to calculate the dependences of the $CF_x$ radicals on the electron density. For an experimental verification of the dependence of the $CF_2$ radical on the electron density, the changes in the electron density and in the $CF_2$ radicals were measured as functions of the rf power. We found that the $CF_2$ radical density increased in the range of low electron densities, and then decreased beyond a critical electron density as the rf power was increased. The theoretical results were in good agreement with the experimental results. We also investigated the changes in $CF_2$ and the electron density in $CF_4$ plasmas for various process conditions, such as pressure, $CF_4$ flow rate, and $O_2$ gas addition. There were dramatic changes in the number of $CF_2$ radicals and the electron density as the parameters were changed.

Keywords

References

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