Bulletin of the Korean Chemical Society

Korean Chemical Society (대한화학회)
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Preparation and Optical Characterization of Mesoporous Silica Films with Different Pore Sizes

  • Bae, Jae-Young (Department of Chemistry, College of Natural Science, Keimyung University) ;
  • Choi, Suk-Ho (College of Electronics and Information and Institute of Natural Sciences, Kyung Hee University) ;
  • Bae, Byeong-Soo (Department of Materials Science and Engineering, Korea Advanced Institute of Science and Technology (KAIST))
  • Published : 2006.10.20
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Abstract

Mesoporous silica films with three different pore sizes were prepared by using cationic surfactant, non-ionic surfactant, or triblock copolymer as structure directing agents with tetramethylorthosilicate as silica source in order to control the pore size and wall thickness. They were synthesized by an evaporation-induced self-assembly process and spin-coated on Si wafer. Mesoporous silica films with three different pore sizes of 2.9, 4.6, and 6.6 nm and wall thickness ranging from $\sim$1 to $\sim$3 nm were prepared by using three different surfactants. These materials were optically transparent mesoporous silica films and crack free when thickness was less than 1 m m. The photoluminescence spectra found in the visible range were peaked at higher energy for smaller pore and thinner wall sized materials, consistent with the quantum confinement effect within the nano-sized walls of the silica pores.

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