Korean Journal of Chemical Engineering

The Korean Institute of Chemical Engineers (한국화학공학회)
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Fabrication of high aspect ratio nanostructures using capillary force lithography

  • Seo, Kap-Yang ;
  • Kim, Jae-Kwan ;
  • Lee, Seong-Hun ;
  • Jeong, Hoon-Eui ;
  • Park, Jee-Won
  • 서갑양 (서울대학교) ;
  • 김재관 (서울대학교) ;
  • 이성훈 (서울대학교) ;
  • 정훈의 (서울대학교) ;
  • 박지원 (서울대학교)
  • Published : 20060000
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Abstract

(MINS101m, Minuta Tech.) has recently been introduced as an alternative to replace polydimethylsiloxane (PDMS)mold for sub-10-nm lithography. Here, we demonstrate that this mold allows for fabrication of various high aspectratio nanostructures with an aspect ratio as high as 4.4 for 80 nm nanopillars. For the patterning method, we used cap-illary force lithography (CFL) involving direct placement of a polyurethane acrylate mold onto a spin-coated polymerfilm followed by raising the temperature above the glass transition temperature of the polymer (Tg). For the patterningmaterials, thermoplastic resins such as polystyrene (PS) and poly(methyl methacrylate) (PMMA) and a zinc oxideapplication of the same method, which is potentially useful for mimicking functional surfaces such as lotus leaf.

Keywords

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