Journal of the Korean institute of surface engineering (한국표면공학회지)

The Korean Institute of Surface Engineering (한국표면공학회)
권호 표지
DOI QR코드

DOI QR Code

Effects of Reactive Gas Addition on the Mechanical Property and Water Permeability of IZO Films Deposited by DC Sputtering for Application to Flexible OLED

DC 마그네트론 스퍼터로 증착한 flexible OLED용 IZO 박막의 기계적 특성과 투습특성에 미치는 반응성 가스 첨가의 효과

  • Cheon, Ko-Eun (School of Materials Science and Engineering, Pusan National University) ;
  • Lee, Dong-Yeop (School of Materials Science and Engineering, Pusan National University) ;
  • Cho, Young-Rae (School of Materials Science and Engineering, Pusan National University) ;
  • Song, Pung-Keun (School of Materials Science and Engineering, Pusan National University)
  • Published : 2007.12.31
Download PDF
⟨ Previous Next ⟩

Abstract

Amorphous IZO films were deposited on PET substrate by DC magnetron sputtering without substrate heating. In order to investigate effect of reactive gas addition on film properties, 0.2-0.4% of $H_2$ or $O_2$ gas was introduced during the deposition. Deposited IZO films were evaluated with mechanical property, electrical property, and water permeability. In the case of $H_2$ gas addition, mechanical property showed clear degradation compared to $O_2$ gas. In the case of $O_2$ gas, water permeability of the IZO film was increased compared to $H_2$ gas which could be attributed to the low adhesion of the film caused by bombardment of high energy negative oxygen ion. As a result, it is confirmed that water permeability of the film could be strongly affected by adhesion of the film.

Keywords

References

  1. T. J. Marks, J. G. C. Veinot, J. Cui, H. Yan, A. Wang, N. L. Edleman, J. Ni, Q. Huang, L, Synth. Met., 127 (2002) 29 https://doi.org/10.1016/S0379-6779(01)00593-8
  2. P. K. Song, H. Akao, M. Kamei, Y. Shigesato, I. Yasui, Jpn. J. Appl. Phys., 38 (1999) 5224 https://doi.org/10.1143/JJAP.38.5224
  3. M. Ando, M. Takabatake, E. Nishimura, K. Onisawa, T. Minemura, J. Non-cryst. Solids, 28 (1996) 198
  4. A. Kaijyo, K. Inoue, S. Matsyzaki, Y. Shigesato, Proceedings for the PRICM-4, 2 (2001) 1787
  5. T. Sasabayashi, N. Ito, M. Kon, P. K. Song, I. Yasui, Jpn. J. Appl. Phys., 39 (2000) 6422 https://doi.org/10.1143/JJAP.39.6422
  6. J. H. Bai, J. M. Moon, S. W. Jung, J. W. Gang, H. G. Kim, J. Korean lnst. Electr. Mater. Engn., 19 (2006) 1134 https://doi.org/10.4313/JKEM.2006.19.12.1134
  7. C. H. Kim, J. H. Lee, B. O. Park, Mater. Sci. Forum, 449 (2004) 469 https://doi.org/10.4028/www.scientific.net/MSF.449-452.469
  8. M. Schaer, F. Nuesch, D. Berner, W. Leo, L. Zuppiroli, Adv. Func. Mater., 11 (2001)
  9. K. E. Cheon, D. Y. Lee, Y. R Cho, G. H. Lee, P. K. Song, to be published in J. Korean Phys. Soc. (2007)
  10. J. S. Oh, Y. R. Cho, K. E. Cheon, M. Karim, S. J. Jung, Solid State Pheno., 124 (2007) 411 https://doi.org/10.4028/www.scientific.net/SSP.124-126.411
  11. S. Gorkhali, D. R. Gairns, G. P. Craqwford, SID DIGEST, (2003) 1332
  12. T. Sasabayashi, P. K. Song, Y. Shigesato, K. Utsumi, A. Mitsui, Mat. Res. Soc. Symp. Proc., 666 (2001)
  13. S. H. Shin, H. H. Kim, J. Korean lnst. Electr. Mater. Engn., 17 (2004) 846 https://doi.org/10.4313/JKEM.2004.17.8.846
  14. N. Ito, Y. Sato, P. K. Song, A. Kaijio, K. Inoue, Y. Shigesato, Thin Solid Films, 496 (2006) 99 https://doi.org/10.1016/j.tsf.2005.08.257
  15. H. M. Kim, J. S. Ahn, K. C. Je, Jpn. J. Appl. Phys., 42 (2003) 5714 https://doi.org/10.1143/JJAP.42.5714
  16. L. Raniero, I. Ferreira, A. Pimentel, A. Goncalves, P. Canhola, E. Fortunato, R. Martins, Thin Solid Films, 511 (2006) 295 https://doi.org/10.1016/j.tsf.2005.12.057
  17. S. F. Lim, W. Wang, S. J. Chua, Adv. Func. Mater., 8 (2002) 513
  18. Y. F. Liew, F. Zhu, S. J. Chua, Chem. Phys. Lett. 394 (2004) 275 https://doi.org/10.1016/j.cplett.2004.07.023
  19. C. Charton, N. Schiller, M. Fahland, A. Hollander, A. Wedel, K. Noller, Thin Solid Films, 502 (2006) 99 https://doi.org/10.1016/j.tsf.2005.07.253