Formation and Characteristics of Self-Assembled InGaN/GaN Quantum-Dot Structure Grown by Using Plasma-Assisted Molecular Beam Epitaxy

Lee, S.J.;Kim, J.O.;Noh, S.K.;Lee, K.S.

  • Published : 20070900

Abstract

We have investigated the photoluminescence (PL) emission characteristics of self-assembled InGaN/GaN quantum dot (QD) structures grown by using the plasma-assisted molecular beam epitaxy technique with an atomic nitrogen plasma source. The low-temperature PL spectrum (15 K) exhibits, due to the InGaN QD, a strong emission at 3.268 eV, accompanied by two longitudinal optical (LO) phonon replicas with an equal energy spacing of 93 meV, in the lower energy region. The PL peak intensities for the QDs gradually decrease and become relatively weaker compared to those for the GaN epilayer due to carrier thermalization in the QDs. The temperature dependences of the PL peaks for the GaN epilayer and the InGaN QDs in the range of 15 -- 300 K, follow very well the Varshni relation, and the LO phonon energy has almost no temperature dependence, (93 + 3) meV, below a quenching temperature of $\sim$100 K.

Keywords

References

  1. S. Nakamura and S. F. Chichibu, Introduction to Nitride Semiconductor Blue Lasers and Light Emitting Diodes (Taylor & Francis, London, 2000)
  2. R. Ascazubi, I. Wilke, K. Denniston, H. Lu and W. J. Schaff, Appl. Phys. Lett. 84, 4810 (2004) https://doi.org/10.1063/1.1759385
  3. V. D. Jovanovic, D. Indjin, Z. Ikoni and P. Harrison, Appl. Phys. Lett. 84, 2995 (2004) https://doi.org/10.1063/1.1707219
  4. J. T. Seo, U. H. Hommerich, A. J. Steckl, B. R. Birkhahn and J. M. Zavada, J. Korean Phys. Soc. 49, 943 (2006)
  5. F. Widmann, J. Simon, B. Daudin, G. Feuillet, J. L. Rouviere, N. T. Pelekanos and G. Fishman, Phys. Rev. B 58, R15989 (1998)
  6. Y. Narukawa, Y. Kawakami, M. Funato, S. Fujita, S. Fujita and S. Nakamura, Appl. Phys. Lett. 70, 981 (1997)
  7. K. Tachibana, T. Somera, Y. Arakawa, R. Wemer and A. Forchel, Appl. Phys. Lett. 75, 2605 (1999)
  8. G. Bais, A. Cristofoli, F. Jabeen, M. Piccin, E. Carlino, S. Rubini, F. Martelli and A. Franciosi, Appl. Phys. Lett. 86, 233107-1 (2005) https://doi.org/10.1063/1.1944899
  9. L. W. Ji, Y. K. Su, S. J. Chang, S. T. Tsai, S. C. Hung, R. W. Chuang, T. H. Fang and T. Y. Tsai, J. Vac. Sci. Technol. A 22, 792 (2004) https://doi.org/10.1116/1.1722353
  10. C. Santori, S. Goetzinger, Y. Yamamoto, S. Kato, K. Hoshino and Y. Arakawa, Appl. Phys. Lett. 87, 051916-1 (2005) https://doi.org/10.1063/1.2006987
  11. N. Preschilla, S. Major, N. Kumar, I. Samajdar and R. S. Srinivasa, Appl. Phys. Lett. 77, 1861 (2000)
  12. P. R. Edwards, R. W. Martin, I. M. Watson, C. Liu, R. A. Taylor, J. H. Rice, J. H. Na, J. W. Robinson and J. D. Smith, Appl. Phys. Lett. 85, 4281 (2004) https://doi.org/10.1063/1.1815043
  13. B. Damilano, N. Grandjean, F. Semond, J. Massies and M. Leroux, Appl. Phys. Lett. 75, 962 (1999)
  14. I. L. Krestnikov, N. N. Ledentsov, A. Hoffmann, D. Bimberg, A. V. Sakharov,W. V. Lundin, A. F. Tsatsul'nikov, A. S. Usikov, Zh. I. Alferov, Yu. G. Musikhin and D. Gerthsen, Phys. Rev. B 66, 155310 (2002)
  15. J. H. Rice, J. W. Robinson, A. Jarjour, R. A. Taylor, R. A. Oliver, G. A. D. Briggs, M. J. Kappers and C. J. Humphreys, Appl. Phys. Lett. 84, 4110 (2004) https://doi.org/10.1063/1.1753653
  16. J. S. Huang, Z. Chen, X. D. Luo, Z. Y. Xu and W. K. Ge, J. Cryst. Growth 260, 13 (2004) https://doi.org/10.1016/j.jcrysgro.2003.08.008
  17. O. Moriwaki, T. Someya, K. Tachibana, S. Ishida and Y. Arakawa, Appl. Phys. Lett. 76, 2361 (2000)
  18. S.-Y. Kwon, H. J. Kim, H. Na, Y.-W. Kim, H.-C. Seo, H. J. Kim, Y. Shin, E. Yoon, Y. Sun, Y.-H. Cho, J.-W. Yoon and H. M. Cheong, J. Korean Phys. Soc. 46, S130 (2005)
  19. B. Daudin, C. Adelmann, N. Gogneau, E. Sarigiannidou, E. Monroy, F. Fossard and J. L. Rouviere, Physica E 21, 540 (2004) https://doi.org/10.1016/j.physe.2003.11.075
  20. B. Daudin, G. Feuillet, H. Mariette, G. Mular, N. Pelekanos, E. Molva, J.-L. Rouviere, C. Adelmann, E. Martinez-Guerrero, J. Barjon, F. Chabuel, B. Bataillou and J. Simon, Jpn. J. Appl. Phys. 40, 1892 (2001)
  21. I.-H. Lee, I. H. Choi, C. R. Lee and S. K. Noh, Appl. Phys. Lett. 71, 1359 (1997)
  22. B.-C. Chung and M. Gershenzon, J. Appl. Phys. 72, 651 (1992)
  23. S. Adachi, Properties of Group-IV, III-V and II-VI Semiconductors (John Wiley & Sons, Chichester, 2005), p. 80
  24. S. Adachi, Properties of Group-IV, III-V and II-VI Semiconductors (John Wiley & Sons, Chichester, 2005), p. 120