Journal of the Korean Ceramic Society (한국세라믹학회지)

The Korean Ceramic Society (한국세라믹학회)
권호 표지
DOI QR코드

DOI QR Code

Plasma Resistances of Yttria Deposited by EB-PVD Method

EB-PVD법으로 코팅된 Y2O3의 내플라즈마 특성

  • Kim, Dae-Min (Korea Institute of Ceramic Engineering and Technology) ;
  • Yoon, So-Young (Korea Institute of Ceramic Engineering and Technology) ;
  • Kim, Kyeong-Beom (Korea Institute of Ceramic Engineering and Technology) ;
  • Kim, Hui-Sik (Korea Institute of Ceramic Engineering and Technology) ;
  • Oh, Yoon-Suk (Korea Institute of Ceramic Engineering and Technology) ;
  • Lee, Sung-Min (Korea Institute of Ceramic Engineering and Technology)
  • 김대민 (요업(세라믹)기술원 이천분원 구조세라믹부) ;
  • 윤소영 (요업(세라믹)기술원 이천분원 구조세라믹부) ;
  • 김경범 (요업(세라믹)기술원 이천분원 구조세라믹부) ;
  • 김희식 (요업(세라믹)기술원 이천분원 구조세라믹부) ;
  • 오윤석 (요업(세라믹)기술원 이천분원 구조세라믹부) ;
  • 이성민 (요업(세라믹)기술원 이천분원 구조세라믹부)
  • Published : 2008.11.30
Download PDF
⟨ Previous Next ⟩

Abstract

Plasma resistant nanocrystalline $Y_2O_3$ films were deposited on alumina substrates through the electron-beam PVD technique. Increasing substrate temperature to $600^{\circ}C$ resulted in the textured microstructures with significantly enhanced adhesion force of the coating to the substrate. During the exposure to fluorine plasma, erosion rate of the coated specimen was higher than that of a sintered yttria specimen, but significantly lower than that of a single crystalline alumina. Considering the adhesion and erosion behaviors observed in the coated specimen prepared at $600^{\circ}C$, the deposition technique appears effective in reducing contamination particles generated from the ceramic parts in the plasma environment.

Keywords

References

  1. G. S. May and C. J. Spanos, "Fundamentals of Semiconductor Manufacturing and Process Control," pp. 98-102, IEEE, New Jersey, 2006
  2. A. J. V. Roosmalen, J. A. G. Baggerman, and S. J. H. Brader, "Dry Etching for VLSI," pp. 39-69, Plenum Press, New York and London, 1991
  3. Y. Kobayashi, "Current Status and Needs in the Future of Ceramics Used for Semiconductor Production Equipment," pp. 1-7 Proceeding of the 37th seminar on the high temperature ceramics, Ceramic Society of Japan, 2005
  4. J. Iwasawa, R. Nishimizu, M. Tokita, M. Kiyohara, and K. Uematsu, "Plasma Resistant Dense Yttrium Oxide Film Prepared by Aerosol Deposition Process," J. Am. Ceram. Soc., 90 [8] 2327-32 (2007) https://doi.org/10.1111/j.1551-2916.2007.01738.x
  5. K. Morita, H. Ueno, and H. Murayama, "Plasma Resistant Articles and Production Method Thereof," US patent 6933254 (2005)
  6. Y. Kobayashi, M. Ichishima, and Y. Yokoyama, "Plasma Resistant Member," US patent 7090932 (2003)
  7. K. Takahashi, M. Okamoto, and M. Abe, "Quartz Glass Parts, Ceramic Parts and Process of Producing Those," US patent 6902814 (2005)
  8. J. Singh and D. E. Wolfe, "Nano and Macro-Structured Component Fabrication by Electron Beam-Physical Vapor Deposition (EB-PVD)," J. Mater. Sci., 40 1-26 (2005) https://doi.org/10.1007/s10853-005-5682-5
  9. L. V. Azaroff, Elements of X-Ray Crystallography; pp. 551- 52 Mcgraw-Hill, New York, 1968
  10. D. R. Clarke and C. G. Levi, "Materials Design for the Next Generation Thermal Barrier Coatings," Annu. Rev. Mater. Res., 33 383-417 (2003) https://doi.org/10.1146/annurev.matsci.33.011403.113718
  11. U. Schulz, C. Leyens, K. Fritscher, M. Peters, B. Saruhan- Brings, O. Lavigne, J.-M. Dorvaux, M. Poulain, R. Mevrel, and M. Caliez, "Some Recent Trends in Research and Technology of Advanced Thermal Barrier Coatings," Aerospace Science and Technology, 7 73-80 (2003) https://doi.org/10.1016/S1270-9638(02)00003-2
  12. T. H. Nielsen and M. H. Leipold, "Thermal Expansion of Yttrium Oxide and of Magnesium Oxide with Yttrium Oxide," J. Am. Ceram. Soc., 47 [5] 256 (1964) https://doi.org/10.1111/j.1151-2916.1964.tb14408.x
  13. R. G. Munro, "Evaluated Material Properties for a Sintered Alpha-$Al_2O_3$," J. Am. Ceram. Soc., 80 [8] 1919-28 (1997) https://doi.org/10.1111/j.1151-2916.1997.tb03074.x
  14. D. M. Kim, S. M. Lee, S. W. Kim, H. T. Kim, and Y. S. Oh, "Microstructural Changes of the $Al_2O_3$ Ceramics during the Exposure to Fluorine Plasma (in Korean)," J. Kor. Ceram. Soc., 45 [7] 405-10 (2008) https://doi.org/10.4191/KCERS.2008.45.7.405

Cited by

  1. Effect of Processing Parameters and Powder Size on Microstructures and Mechanical Properties of Y2O3 Coatings Fabricated by Suspension Plasma Spray vol.52, pp.6, 2015, https://doi.org/10.4191/kcers.2015.52.6.395
  2. Effects of Powder Melting Degree on Microstructural Features of Plasma Sprayed Y2O3 Coating vol.26, pp.5, 2016, https://doi.org/10.3740/MRSK.2016.26.5.229
  3. Fabrication and Characterisitics of Al2O3-SiC Ceramic Composites for Electrostatic Discharge Safe Components vol.25, pp.2, 2018, https://doi.org/10.4150/KPMI.2018.25.2.144