Current Applied Physics

Korean Physical Society (한국물리학회)
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Analysis of resin flow during nano-imprinting lithographic process

Kang, J.H.;Kim, S.M.;Woo, Y.S.;Lee, W.I.

  • Published : 20081100
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Abstract

Viscous flow of the resin in nano-imprinting lithography has been investigated. Flow behavior of the thermoplastic polymer was analyzed experimentally as well as numerically. Effects of process variables such as the temperature and the pressure and the stamp geometry on the filling pattern were studied. In order to observe the effect of stamp geometry, three different types of geometries were considered. Experiments were performed using polymethylmethacrylate (PMMA) sheets. Filled patterns were observed using a scanning electron microscopy (SEM). Fixed grid method along with the finite element method was used for numerical analysis. Numerical results exhibited a similar tendency as the experimental observation.

Keywords

References

  1. S.Y. Chou, P.R. Krauss, W. Zhang, L. Guo, L. Zhuang, J. Vac. Sci. Technol. B 15 (1997) 2897-2904 https://doi.org/10.1116/1.589752
  2. S.Y. Chou, P.R. Krauss, P. Renstrom, Science 272 (1996) 85-87 https://doi.org/10.1126/science.272.5258.85
  3. P.R. Krauss, S.Y. Chou, Appl. Phys. Lett. 71 (21) (1997) 3174-3176 https://doi.org/10.1063/1.120280
  4. H.-C. Scheer, H. Schulz, T. Hoffman, C.M. Sotomayor Torres, J. Vac. Sci. Technol. B 16 (1998) 3917 https://doi.org/10.1116/1.590436
  5. L.J. Juang, L.J. Lee, K.W. Koelling, Polym. Eng. Sci. 42 (2002) 551-566 https://doi.org/10.1002/pen.10971
  6. X.J. Shen, L.W. Pan, L. Lin, Sens. Actuators A 97-98 (2002) 428-433 https://doi.org/10.1016/S0924-4247(02)00029-8
  7. Y. Hirai, M. Fujiwara, T. Okuno, Y. Tanaka, J. Vac. Sci. Technol. B 19 (2001) 1023-1071 https://doi.org/10.1116/1.1375822
  8. J.H. Jeong, Y.S. Choi, T.J. Shin, J.J. Lee, K.T. Park, E.S. Lee, S.R. Lee, Fibers Polym. 3 (2002) 113 https://doi.org/10.1007/BF02892627
  9. L.J. Heyderman, H. Schift, C. David, I. Govrecht, T. Schweizer, Microelectron. Eng. 54 (2000) 229-245 https://doi.org/10.1016/S0167-9317(00)00414-7
  10. J.U. Brackbill, D.B. Kothe, C. Zenmach, J. Comput. Phys. 100 (1992) 335-354 https://doi.org/10.1016/0021-9991(92)90240-Y