Current Applied Physics

Korean Physical Society (한국물리학회)
권호 표지

The growth mechanism and supercapacitor study of anodically deposited amorphous ruthenium oxide films

Patake, V.D.;Pawar, S.M.;Shinde, V.R.;Gujar, T.P.;Lokhande, C.D.

  • Published : 20100000
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Abstract

In the present study, ruthenium oxide ($RuO_2$) thin films were deposited on the stainless steel (s.s.) substrates by anodic deposition. The nucleation and growth mechanism of electrodeposited $RuO_2$ film has been studied by cyclic voltammetry (CV) and chronoamperometry (CA). The deposited films were characterized by X-ray diffraction (XRD), scanning electron microscopy (SEM), transmission electron microscopy (TEM) and energy dispersive analysis by X-rays (EDAX) for structural, morphological, and compositional studies. The electrochemical supercapacitor study of ruthenium oxide thin films have been carried out for different film thicknesses in 0.5 M $H_2SO_4$ electrolyte. The highest specific capacitance was found to be 1190 F/g for 0.376 mg/$cm^{2}$ film thickness.

Keywords

References

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