Journal of KIISE:Software and Applications (한국정보과학회논문지:소프트웨어및응용)

Korean Institute of Information Scientists and Engineers (한국정보과학회)
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Detection of Defects on Repeated Multi-Patterned Images

반복되는 다수 패턴 영상에서의 불량 검출

  • 이장희 (서울대학교 전기컴퓨터공학부) ;
  • 유석인 (서울대학교 전기컴퓨터공학부)
  • Received : 2009.10.27
  • Accepted : 2010.02.17
  • Published : 2010.05.15
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Abstract

A defect in an image is a set of pixels forming an irregular shape. Since a defect, in most cases, is not easy to be modeled mathematically, the defect detection problem still resides in a research area. If a given image, however, composed by certain patterns, a defect can be detected by the fact that a non-defect area should be explained by another patch in terms of a rotation, translation, and noise. In this paper, therefore, the defect detection method for a repeated multi-patterned image is proposed. The proposed defect detection method is composed of three steps. First step is the interest point detection step, second step is the selection step of a appropriate patch size, and the last step is the decision step. The proposed method is illustrated using SEM images of semiconductor wafer samples.

영상에서 일정 영역의 화소들이 불규칙적인 형태를 이루는 것을 불량이라 하는데 이를 수학적으로 정확히 정의하기 어렵다는 점이 불량 검출을 쉽지 않게 한다. 하지만 주어진 영상이 다수의 반복되는 패턴을 가지고 있다면 불량이 아닌 영역은 그 외의 다른 영역들로 설명되어 될 수 있다는 점을 이용하여 영상내의 불량 영역을 찾아낼 수 있다. 따라서 본 논문은 이러한 특성을 이용하여 다양한 패턴이 반복되는 영상에 존재하는 불량을 검출하는 방법을 제시한다. 제시된 방법은 크게 세 단계로 이루어진다. 첫 번째 단계는 interest point 검출단계이다. 두 번째 단계는 적절한 패치의 크기를 결정하는 단계이다. 마지막으로 세 번째 단계는 불량을 검출하는 단계이다. 제시된 방법은 반도체 wafer를 SEM을 이용하여 촬영한 영상들을 통하여 예증된다.

Keywords

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