열처리공학회지 (Journal of the Korean Society for Heat Treatment)

  • 제24권4호
  • /
  • Pages.199-202
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  • 2011
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  • 1225-1070(pISSN)
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  • 2508-4046(eISSN)
한국열처리공학회 (The Korean Society for Heat Treatment)
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RF 마그네트론 스퍼터링으로 증착 된 GZO 박막의 진공 열처리온도에 따른 구조적, 광학적, 전기적 특성 연구

Effect of Post Deposition Annealing Temperature on the Structural, Optical and Electrical Properties of GZO Films Prepared by RF Magnetron Sputtering

  • 김대일 (울산대학교 첨단소재공학부)
  • Kim, Daeil (School of materials science and Engineering, University of Ulsan)
  • 투고 : 2011.06.10
  • 심사 : 2011.07.13
  • 발행 : 2011.07.30
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초록

Ga doped ZnO thin films were deposited with RF magnetron sputtering on glass substrate without intentional substrate heating and then the effect of post deposition annealing temperature on the structural, optical and electrical properties of the films was investigated. The post deposition annealing process was conducted for 30 minutes in a vacuum of $1{\times}10^{-3}$ Torr and the vacuum annealing temperatures were 150 and $300^{\circ}C$, respectively. As increase annealing temperature, GZO films show the increment of the prefer orientation of ZnO (002) diffraction peak in the XRD pattern and the optical transmittance in a visible wave region was also increased, while the electrical sheet resistance was decreased. The figure of merit obtained in this study means that GZO films which vacuum annealed at $300^{\circ}C$ have the highest optoelectrical performance in this study.

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참고문헌

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