References
- S.J. Pearton, J.C. Zolper, R.J. Shul, F.J. Ren, J. Appl. Phys. 86 (1999) 1. https://doi.org/10.1063/1.371145
- H. Morkoc, S. Strite, G.B. Gao, M.E. Lin, B. Sverdlov, M. Burns, J. Appl. Phys. Rev. 76 (1994) 1363. https://doi.org/10.1063/1.358463
- S.N. Mohammad, H. Morkoc, Prog. Quantum Electron 20 (1996) 361. https://doi.org/10.1016/S0079-6727(96)00002-X
- S.N. Mohammad, H. Morkoc, Science 267 (1995) 51. https://doi.org/10.1126/science.267.5194.51
- L.C. Chen, C.Y. Hsu, W.H. Lan, S.Y. Teng, Solid-State Electron 47 (2003) 1843. https://doi.org/10.1016/S0038-1101(03)00129-1
- R. Werner, M. Reinhardt, M. Emmerling, A. Forchel, V. Harle, A. Bazhenov, Physica E 7 (2000) 915. https://doi.org/10.1016/S1386-9477(00)00087-4
- D. Mistele, Mater. Sci. Eng. B 93 (2002) 107. https://doi.org/10.1016/S0921-5107(02)00052-1
- S. Pearton, Mater. Sci. Eng. B 82 (2001) 227. https://doi.org/10.1016/S0921-5107(00)00767-4
- K.M. Chang, C.C. Chen, C.C. Lang, Solid-State Electron 46 (2002) 1399. https://doi.org/10.1016/S0038-1101(02)00085-0
- J. Kuzmik, G. Konstantinidis, S. Harasek, S. Hascik, E. Bertagnolli, A. Georgakilas, D. Pogany, Semicond. Sci. Technol. 19 (2004) 1364. https://doi.org/10.1088/0268-1242/19/12/006
- C. Bae, C. Krug, G. Lucovsky, J. Vac. Sci. Technol. A 22 (6) (2004) 2379.
- T.-H. Tsai, H.-I. Chen, K.-W. Lin, Y.-W. Kuo, C.-F. Chang, C.-W. Hung, L.-Y. Chen, T.-P. Chen, Y.-C. Liu, W.-C. Liu, Sens. Actuators, B 136 (2009) 338. https://doi.org/10.1016/j.snb.2008.12.030
- F. Tian, E.F. Chor, Thin Solid Films 518 (2010) e121. https://doi.org/10.1016/j.tsf.2010.03.106
- T. Sawada, Y. Ito, K. Imai, K. Suzuki, H. Tomozawa, S. Sakai, Appl. Surf. Sci. 159 (2000) 449.
- T. Hashizume, E. Alekseev, D. Pavlidis, K.S. Boutros, J. Redwing, J. Appl. Phys. 88 (2000) 1983. https://doi.org/10.1063/1.1303722
- Y. Nakano, T. Jimbo, Appl. Phys. Lett. 80 (2002) 4756. https://doi.org/10.1063/1.1486266
- Z. Tekeli, S. Altindal, M. Cakmak, S. Ozcelik, D. Caliskan, E. Ozbay, J. Appl. Phys. 102 (2007) 054510. https://doi.org/10.1063/1.2777881
- T.-H. Tsai, J.-R. Huang, K.-W. Lin, W.-C. Hsu, H.-I. Chen, W.-C. Liu, Sens. Actuators, B 129 (2008) 292. https://doi.org/10.1016/j.snb.2007.08.028
- Z. Tekeli, S. Altindal, M. Cakmak, S. Ozcelik, E. Ozbay, Microelectron. Eng. 85 (2008) 2316. https://doi.org/10.1016/j.mee.2008.08.005
- E. Arslan, Y. Safak, S. Altindal, O. Kelekci, E. Ozbay, J. Non-Cryst. Solids 356 (2010) 1006. https://doi.org/10.1016/j.jnoncrysol.2010.01.024
- T. C- Lee, J.-T. Yan, Sens. Actuators, B 147 (2010) 723. https://doi.org/10.1016/j.snb.2010.04.008
- S. Demirezen, S. Altindal, Physica B 405 (2010) 1130. https://doi.org/10.1016/j.physb.2009.11.015
- E. Arslan, S. Butun, Y. Safak, H. Uslu, I. Tascioglu, S. Altindal, E. Ozbay, Microelectron. Reliab. 51 (2011) 370. https://doi.org/10.1016/j.microrel.2010.08.022
- S.M. Sze, Physics of Semiconductor Devices. Wiley, New York, 1981.
- E.H. Rhoderick, R.H. Williams, Metal-sSemiconductor Contacts. Clarendan, Oxford, 1988.
- S.K. Cheung, N.W. Cheung, Appl. Phys. Lett. 49 (1986) 85. https://doi.org/10.1063/1.97359
- X.J. Wang, L. He, J. Electron. Mater. 27 (1998) 1272. https://doi.org/10.1007/s11664-998-0082-7
- V. .Rajagopal Reddy, M. Siva Pratap Reddy, B. Prasanna Lakshmi, A. Ashok Kumar, J.Alloys Compd. 509 (2011) 8001. https://doi.org/10.1016/j.jallcom.2011.05.055
- S. Karatas, S. Altindal, A. Turut, A. Ozmen, Appl. Surf. Sci. 217 (2003) 250. https://doi.org/10.1016/S0169-4332(03)00564-6
- J.H. Werner, H.H. Guttler, J. Appl. Phys. 69 (1991) 152.
- A. Gumus, A. Turut, N. Yalcin, J. Appl. Phys. 91 (2002) 245. https://doi.org/10.1063/1.1424054
- S. Chand, J. Kumar, Appl. Phys. A 63 (1996) 171.
- S. Chand, J. Kumar, J. Appl. Phys. 80 (1996) 288. https://doi.org/10.1063/1.362818
- J.P. Sullivan, R.T. Tung, M.R. Pinto, W.R. Graham, J. Appl. Phys. 70 (1991) 7403. https://doi.org/10.1063/1.349737
- R.T. Tung, Phys. Rev. B 45 (1992) 13509. https://doi.org/10.1103/PhysRevB.45.13509
- R.F. Schmisdorf, T.U. Kampen, W. Monch, Surf. Sci. 324 (1995) 249. https://doi.org/10.1016/0039-6028(94)00791-8
- S. Zhu, R.L. Van Meirhaeghe, C. Detavernier, F. Cardon, G.P. Ru, X.P. Qu, B.Z. Li, Solid-State Electron 44 (2000) 663. https://doi.org/10.1016/S0038-1101(99)00268-3
- S. Chand, Semicond. Sci. Technol. 19 (2004) 82. https://doi.org/10.1088/0268-1242/19/1/014
- S. Zeyrek, S. Altindal, H. Yuzer, M.M. Bulbul, Appl. Surf. Sci. 252 (2006) 2999. https://doi.org/10.1016/j.apsusc.2005.05.008
- S. Chand, J. Kumar, Semicond. Sci. Technol. 11 (1996) 1203. https://doi.org/10.1088/0268-1242/11/8/015
- H.C. Card, E.H. Rhoderick, J. Phys. D: Appl. Phys. 4 (1971) 1589. https://doi.org/10.1088/0022-3727/4/10/319
- A. Turut, M. Saglam, H. Efeoglu, N. Yalcin, M. Yildirim, B. Abay, Physica B 205 (1995) 41. https://doi.org/10.1016/0921-4526(94)00229-O
- O. Gullu, A. Turut, J. Appl. Phys. 106 (2009) 103717(6).
- A. Singh, K.C. Reinhardt, W.A. Anderson, J. Appl. Phys. 68 (1990) 4788. https://doi.org/10.1063/1.346135
- M.K. Hudait, S.B. Krupanidhi, Mater. Sci. Eng. B 87 (2001) 141. https://doi.org/10.1016/S0921-5107(01)00713-9
- X. Wu, E.S. Yang, J. Appl. Phys. 65 (1989) 3560. https://doi.org/10.1063/1.342631
- B. Akkal, Z. Benemara, A. Boudissa, N.B. Bouiadjra, M. Amrani, I. Bideux, Mater. Sci. Eng. B 55 (1998) 162. https://doi.org/10.1016/S0921-5107(98)00168-8
Cited by
- Study of barrier inhomogeneities in I-V-T and C-V-T characteristics of Al/Al2O3/PVA:n-ZnSe metal-oxide-semiconductor diode vol.112, pp.2, 2012, https://doi.org/10.1063/1.4737589
- Effect of alloy composition on structural, optical and morphological properties and electrical characteristics of GaxIn1−xP/GaAs structure vol.24, pp.4, 2012, https://doi.org/10.1007/s10854-012-0937-9
- Pt/n-GaN metal-semiconductor and Pt/HfO2/n-GaN metal-insulator-semiconductor Schottky diodes vol.1736, pp.None, 2012, https://doi.org/10.1557/opl.2014.938
- Investigation of current‐voltage characteristics and current conduction mechanisms in composites of polyvinyl alcohol and bismuth oxide vol.54, pp.8, 2014, https://doi.org/10.1002/pen.23726
- Electrical characteristics of Au/Ti/n-GaAs contacts over a wide measurement temperature range vol.89, pp.9, 2014, https://doi.org/10.1088/0031-8949/89/9/095804
- On double exponential forward bias current-voltage (I–V) characteristics of Au/Ca3Co4Ga0.001Ox/n-Si/Au (MIS) type structures in temperature range of 80–340 K vol.95, pp.10, 2012, https://doi.org/10.1080/14786435.2015.1009517
- Temperature dependent electrical characterisation of Pt/HfO2/n-GaN metal-insulator-semiconductor (MIS) Schottky diodes vol.5, pp.9, 2012, https://doi.org/10.1063/1.4930199
- Electrical properties and transport mechanisms of Au/Ba0.6Sr0.4TiO3/GaN metal-insulator-semiconductor (MIS) diode at high temperature range vol.122, pp.5, 2012, https://doi.org/10.1007/s00339-016-0047-2
- Double exponential I-V characteristics and double Gaussian distribution of barrier heights in (Au/Ti)/Al2O3/n-GaAs (MIS)-type Schottky barrier diodes in wide temperature range vol.122, pp.12, 2016, https://doi.org/10.1007/s00339-016-0558-x
- Interpretation of barrier height inhomogeneities in Au/In2S3/SnO2/(In-Ga) structures at low temperatures vol.28, pp.10, 2012, https://doi.org/10.1007/s10854-017-6440-6
- Frequency and voltage dependent electrical and dielectric properties of SiGe thin films for solar cells application deposited on p-type silicon vol.49, pp.1, 2012, https://doi.org/10.1007/s11082-016-0846-x
- A study of temperature dependent current-voltage (I-V-T) characteristics in Ni/sol-gel β-Ga2O3/n-GaN structure vol.29, pp.13, 2012, https://doi.org/10.1007/s10854-018-9213-y
- Interfacial Properties of Atomic Layer Deposited Al2O3/AlN Bilayer on GaN vol.28, pp.5, 2018, https://doi.org/10.3740/mrsk.2018.28.5.268
- Schottky Junction Vertical Channel GaN Static Induction Transistor with a Sub‐Micrometer Fin Width vol.5, pp.1, 2012, https://doi.org/10.1002/aelm.201800689
- Investigation, analysis and comparison of current-voltage characteristics for Au/Ni/GaN Schottky structure using I-V-T simulation vol.37, pp.3, 2019, https://doi.org/10.2478/msp-2019-0041
- Electrical and Structural Properties of All-Sputtered Al/SiO2/p-GaN MOS Schottky Diode vol.9, pp.10, 2012, https://doi.org/10.3390/coatings9100685
- The possible current-conduction mechanism in the Au/(CoSO4-PVP)/n-Si junctions vol.31, pp.21, 2012, https://doi.org/10.1007/s10854-020-04406-3
- On the Multi-parallel Diodes Model in Au/PVA/n-GaAs Schottky Diodes and Investigation of Conduction Mechanisms (CMs) in a Temperature Range of 80-360 K vol.49, pp.12, 2012, https://doi.org/10.1007/s11664-020-08473-4
- Temperature dependence of electrical parameters of the Cu/n-Si metal semiconductor Schottky structures vol.1224, pp.None, 2012, https://doi.org/10.1016/j.molstruc.2020.129057
- Current-voltage characteristics and photovoltaic effect of a Au/ZnFe2O4/GaN Schottky junction vol.54, pp.9, 2012, https://doi.org/10.1088/1361-6463/abc8b8
- Temperature analysis of the Gaussian distribution modeling the barrier height inhomogeneity in the Tungsten/4H-SiC Schottky diode vol.127, pp.9, 2021, https://doi.org/10.1007/s00339-021-04787-0