Applied Chemistry for Engineering (공업화학)

The Korean Society of Industrial and Engineering Chemistry (한국공업화학회)
권호 표지

A Study on Isoelectric Point and Softness of an Ethylene Oxide Adducted Amphoteric Surfactant

에틸렌 옥사이드가 부가된 양쪽성 계면활성제의 등전점 및 유연력에 관한 연구

  • Lim, JongChoo (Department of Chemical and Biochemical Eng., Dongguk University) ;
  • Park, JunSeok (Central Research Laboratories, Aekyung) ;
  • Han, DongSung (Central Research Laboratories, Aekyung) ;
  • Kim, JiSung (Department of Chemical and Biochemical Eng., Dongguk University) ;
  • Lee, Seul (Department of Chemical and Biochemical Eng., Dongguk University) ;
  • Mo, DaHee (Department of Chemical and Biochemical Eng., Dongguk University) ;
  • Lee, JinSun (Department of Chemical and Biochemical Eng., Dongguk University)
  • 임종주 (동국대학교 공과대학 화공생물공학과) ;
  • 박준석 (애경산업(주) 중앙연구소) ;
  • 한동성 (애경산업(주) 중앙연구소) ;
  • 김지성 (동국대학교 공과대학 화공생물공학과) ;
  • 이슬 (동국대학교 공과대학 화공생물공학과) ;
  • 모다희 (동국대학교 공과대학 화공생물공학과) ;
  • 이진선 (동국대학교 공과대학 화공생물공학과)
  • Published : 2012.12.10
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Abstract

In this study, we analyzed the physical properties of an ethylene oxide adducted amphoteric surfactant such as critical micelle concentration, surface tension, interfacial tension, contact angle, viscosity and phase behavior. The dual function characteristics of an amphoteric surfactant were investigated by determining an isoelectric point, which were attained using zeta potential measurements and quartz crystal microbalance (QCM) experiments. The isoelectric points of DE3-OSA82-AO, DE5-OSA82-AO and DE9-OSA82-AO surfactant systems determined by zeta potential measurements were 6.97, 6.93 and 7.10 respectively and they are in good agreement with the isoelectric point values measured by QCM experiments. The frictional property measured using an automated mildness tester showed that the DE-OSA82-AO surfactant could provide a good softening effect at neutral condition.

본 연구에서는 에틸렌 옥사이드가 부가된 양쪽성 계면활성제에 대하여 기본적인 물성(임계 마이셀 농도, 표면장력, 계면장력, 접촉각, 점도, 계면활성제 시스템의 상거동 등)을 측정하였다. 또한 계면활성제 수용액에 대한 제타 전위 측정과 QCM 실험을 통하여 양쪽성 계면활성제가 양이온 계면활성제에서 비이온 계면활성제로 작용이 전환되는 등 전점을 결정하였다. 제타 전위 측정에 의하여 결정한 DE3-OSA82-AO, DE5-OSA82-AO 및 DE9-OSA82-AO 계면활성제 시스템의 등전점은 각각 6.97, 6.93 및 7.10이며, 이 결과는 QCM 측정 실험으로부터 결정한 각각의 등전점 6.97, 6.83 그리고 7.02의 값과 거의 일치하였다. 표면 마찰 시험기를 사용하여 계면활성제로 세정한 섬유의 평균 마찰계수 값을 측정한 결과, 계면활성제 수용액의 pH가 중성인 조건에서 섬유 유연 효과가 우수함을 확인하였다.

Keywords

References

  1. W. G. Cutler and E. Kissa, Detergency : Theory and Technology, Surfactant Science Series, 20, 1, Marcel Dekker, New York (1987).
  2. A. M. Schwartz, The Physical Chemistry of Detergency ed. E. Matijevic, Surface Colloid Sci., 195, Wiley, New York (1972).
  3. C. A. Miller and P. Neogi, Interfacial Phenomena : Equilibrium and Dynamic Effects, Surfactant Science Serie, 17, 150, Marcel Dekker, New York (1985).
  4. J. C. Lim, J. Kor. Ind. Eng. Chem., 6, 610 (1995).
  5. J. C. Lim, J. Kor. Ind. Eng. Chem., 8, 473 (1997).
  6. S. K. Lee, J. W. Han, B. H. Kim, P. G. Shin, S. K. Park, and J. C. Lim, J. Kor. Ind. Eng. Chem., 10, 537 (1999). https://doi.org/10.1007/s100510050883
  7. H. K. Ko, B. D. Park, and J. C. Lim, J. Kor. Ind. Eng. Chem., 11, 679 (2000).
  8. J. G. Lee, S. S. Bae, I. S. Cho, S. J. Park, B. D. Park, S. K. Park, and J. C. Lim, J. Kor. Ind. Eng. Chem., 16, 664 (2005).
  9. J. G. Lee, S. S. Bae, I. S. Cho, S. J. Park, B. D. Park, S. K. Park, and J. C. Lim, J. Kor. Ind. Eng. Chem., 16, 677 (2005).
  10. J. C. Lim, J. Kor. Ind. Eng. Chem., 16, 778 (2005).
  11. M. J. Bae and J. C. Lim, J. Kor. Ind. Eng. Chem., 20, 15 (2009).
  12. M. J. Bae and J. C. Lim, Korean Chem. Eng. Res., 47, 24 (2009).
  13. M. J. Bae and J. C. Lim, Korean Chem. Eng. Res., 47, 46 (2009).
  14. M. J. Bae and J. C. Lim, J. Kor. Ind. Eng. Chem., 20, 473 (2009).
  15. S. Lee, B. J. Kim, J. G. Lee, and J. C. Lim, Appl. Chem. Eng., 22, 37 (2011).
  16. U. S. Patent 7,538,248 (2009).
  17. J. C. Lim, J. S. Kim, D. H. Mo, and J. S. Lee, Appl. Chem. Eng., 23, 112 (2012).
  18. D. S. Han, K. M. Yoo, J. S. Park, G. Y. Chi, K. M. Lee, and J. C. Lim, Applied Chemistry, 11, 229 (2007). https://doi.org/10.1002/jctb.5010110701
  19. K. Rendall, G. J. T. Tiddy, and M. A. Trevethan, J. Colloid Interface Sci., 98, 565 (1984) https://doi.org/10.1016/0021-9797(84)90183-8
  20. H. Hoffmann, C. Thunig, and C. A. Miller, Colloid Surf. A: Physicochem. Eng. Aspects, 67, 223 (1992).
  21. Y. C. Ro and K. D. Nam, J. Kor. Ind. Eng. Chem., 5, 749 (1994).
  22. M. J. Rosen, T. Gao, Y. Nakasuji, and A. Masuyama, Colloid Surf. A: Physicochem. Eng. Aspects, 88, 1 (1994). https://doi.org/10.1016/0927-7757(94)80080-4
  23. M. J. Rang, J. C. Lim, C. A. Miller, C. Thunig, and H. H. Hoffmann, J. Colloid Interface Sci., 175, 440 (1995). https://doi.org/10.1006/jcis.1995.1474
  24. I. Harwigsson, F. Tiberg, and Y. Chevalier, J. Colloid Interface Sci., 183, 380 (1996). https://doi.org/10.1006/jcis.1996.0560
  25. P. D. Maria, A. Fontana, C. Gasbarri, and G. Siani, Tetrahedron, 61, 7176 (2005). https://doi.org/10.1016/j.tet.2005.05.035
  26. J. C. Lim and D. S. Han, Colloid Surf. A: Physicochem. Eng. Aspects, 389, 166 (2011). https://doi.org/10.1016/j.colsurfa.2011.08.034
  27. J. C. Lim, J. S. Kim, and J. S. Lee, Accepted at Appl. Chem. Eng. (2012).
  28. J. S. Kim, J. S. Park, and J. C. Lim, J. Kor. Ind. Eng. Chem., 20, 9 (2009).
  29. J. S. Kim, J. S. Park, and J. C. Lim, Korean Chem. Eng. Res., 47, 31 (2009).
  30. J. S. Kim and J. C. Lim, J. Kor. Ind. Eng. Chem., 20, 479 (2009).
  31. J. S. Kim and J. C. Lim, Korean Chem. Eng. Res., 47, 38 (2009).
  32. T. Y. Chiu and A. E. James, Colloid Surf. A: Physicochem, Eng. Aspects, 280, 58 (2006). https://doi.org/10.1016/j.colsurfa.2006.01.030
  33. M. W. Jeong, S. G. Oh, and Y. C. Kim, Colloid Surf. A: Physicochem. Eng. Aspects, 181, 247 (2001). https://doi.org/10.1016/S0927-7757(00)00796-2