Korean Journal of Metals and Materials (대한금속재료학회지)

The Korean Institute of Metals and Materials (대한금속재료학회)
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Characteristics of ITO Films Grown on an Oxygen Plasma Treated Glass Substrate

유리기판에 O2 플라즈마 표면처리 후 제작된 ITO 박막의 특성

  • Chae, Hong-Chol (Department of Advanced Materials Engineering, Chungbuk National University) ;
  • Hong, Joo-Wha (Department of Advanced Materials Engineering, Chungbuk National University)
  • 채홍철 (충북대학교 신소재공학과) ;
  • 홍주화 (충북대학교 신소재공학과)
  • Received : 2012.02.28
  • Published : 2012.07.25
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Abstract

The optical and electronic properties of Indium Tin Oxide (ITO) thin films deposited on a RF-plasma treated glass substrate were investigated by X-Ray Photoelectron Spectroscopy (XPS), Ultra-violet Photoelectron Spectroscopy (UPS), Reflected Electron Energy Loss Spectroscopy (REELS). The modification of glass substrates was carried out by varying the time of the plasma surface treatment in an oxygen atmosphere. The focus of this research was to examine how the optical and electronic properties of ITO thin films change with the plasma treatment time. The surface energy increased since the carbon bonds were removed from the surface after the glass substrate received the surface treatment. The ITO thin films produced on the glass substrate with surface treatment showed that the high optical transmittance was approximately 85%. The measured band gap energy was as high as 3.23 eV when the plasma treatment time was 60 s and the work function after the treatment was increased by 0.5 eV in comparison to that before the treatment of 60 s. The ITO thin film exhibited an excellent sheet resistance of $2.79{\Omega}/{\Box}$. We found that the optical and electronic properties of ITO thin films can be improved by RF-plasma surface treatment.

Keywords

Acknowledgement

Supported by : 충북대학교

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