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- From design for manufacturing (DFM) to manufacturing for design (MFD) via hybrid manufacturing and smart factory: A review and perspective of paradigm shift vol.3, pp.2, 2015, https://doi.org/10.1007/s40684-016-0028-0
- A Study on Pressure Distribution for Uniform Polishing of Sapphire Substrate vol.32, pp.2, 2015, https://doi.org/10.9725/kstle.2016.32.2.61
- Slurry Components in Metal Chemical Mechanical Planarization (CMP) Process: A Review vol.17, pp.12, 2015, https://doi.org/10.1007/s12541-016-0201-y
- Self-dressing effect using a fixed abrasive platen for single-sided lapping of sapphire substrate vol.31, pp.12, 2015, https://doi.org/10.1007/s12206-017-1105-1
- Estimating the mechanical properties of polyurethane-impregnated felt pads vol.31, pp.12, 2015, https://doi.org/10.1007/s12206-017-1111-3
- Role of a New Type Chelating Agent in Chemical Mechanical Polishing of R-Plane Sapphire Substrate vol.6, pp.9, 2017, https://doi.org/10.1149/2.0201709jss
- Effect of a pH Regulator on Sapphire Substrate CMP vol.6, pp.12, 2015, https://doi.org/10.1149/2.0221712jss
- Study on effect of the surface variation of colloidal silica abrasive during chemical mechanical polishing of sapphire vol.56, pp.7, 2015, https://doi.org/10.7567/jjap.56.07kb01
- Research on R-Plane Sapphire Substrate CMP Removal Rate Based on a New-Type Alkaline Slurry vol.7, pp.3, 2015, https://doi.org/10.1149/2.0241803jss
- Effects of mixed ultrafine colloidal silica particles on chemical mechanical polishing of sapphire vol.57, pp.7, 2015, https://doi.org/10.7567/jjap.57.07md03
- Effect of Relative Surface Charge of Colloidal Silica and Sapphire on Removal Rate in Chemical Mechanical Polishing vol.6, pp.2, 2019, https://doi.org/10.1007/s40684-019-00020-9
- Pollution-Free Approaches for Highly Efficient Sapphire Substrate Processing by Mechanical Chemical Polishing vol.9, pp.7, 2015, https://doi.org/10.3390/catal9070594
- Semi-empirical Material Removal Model with Modified Real Contact Area for CMP vol.20, pp.8, 2015, https://doi.org/10.1007/s12541-019-00161-6
- Shear Thickening Polishing of Black Lithium Tantalite Substrate vol.21, pp.9, 2020, https://doi.org/10.1007/s12541-020-00362-4
- Study on the enhancement of sol-gel properties by binary compounding technology for dry polishing hard and brittle materials vol.96, pp.2, 2015, https://doi.org/10.1007/s10971-020-05339-3
- A Pilot Study on Machining Difficult-to-Cut Materials with the Use of Tools Fabricated by SLS Technology vol.14, pp.18, 2015, https://doi.org/10.3390/ma14185306