Journal of Ceramic Processing Research

Ceramic Processing Research Center (한양대학교 세라믹연구소)
권호 표지

Effects of the cathode magnetic field strength on the properties of sputtered ultrathin ITO films

  • Park, So Yoon (Department of Materials Science and Engineering, Pusan National University) ;
  • Kim, Min Je (Department of Materials Science and Engineering, Pusan National University) ;
  • Song, Pung Keun (Department of Materials Science and Engineering, Pusan National University)
  • Published : 2015.04.01
⟨ Previous Next ⟩

Abstract

Ultrathin indium tin oxide (ITO) films 20 nm thickness were manufactured by DC magnetron sputtering for touch sensor applications. Deposition was performed at room temperature on PET substrates, with a substrate-to-target distance of 50 mm, and a power and working pressure of 100 W and 0.28 Pa, respectively. This study focused on improving the electrical properties of ultrathin ITO films, which are typically poor. So, we controlled the initial growth process of the ITO films by optimizing the cathode magnetic field strength (CMFS) (550 G, 850 G, and 1450 G). The electrical properties of the thin films were optimal at the higher CMFS (1450 G) and the surface morphology and wetting properties also improved with strengthening CMFS. This is thought to be the result of a reduction in the damage incurred on the growing film as the plasma impedance and the high-energy particle ($Ar^O$, $O^-$) bombardment were reduced. Improved thin film properties can therefore be achieved by reducing high energetic particle ($Ar^O$, $O^-$) bombardment and increasing the number of sputter atoms with appropriate energy. In other words, the cathode-voltage ($V_C$) and cathode-current ($I_C$) during sputtering should be carefully adjusted.

Keywords

Acknowledgement

Supported by : Ministry of Trade, Industry and Energy, Korea (MOTIE), Korea Institute of Energy Technology Evaluation and Planning (KETEP)

References

  1. Y. Shigesato, R. Koshi-ishi, T. Kawashima and J. Ohsako, Vacuum. 59 [2-3] (2000) 614-621. https://doi.org/10.1016/S0042-207X(00)00324-9
  2. A. Eshaghi and A. Graeli, Optik. 125 [3] (2014) 1478-1481. https://doi.org/10.1016/j.ijleo.2013.09.011
  3. H.J. Choi, S,G Yoon, J.H Lee and J.Y. Lee, J. Sol-Gel Sci. Technol. 1 [5] (2012) 106-109.
  4. X.W. Sun, H.C. Huang, and H.S.Kwok, Appl. Phys. Lett. 68 [19] (1996) 2663-2665. https://doi.org/10.1063/1.116274
  5. P.K. Song, H. Akao, M. Kamei, Y. Shigesato and I. Yasui, Jpn. J. Appl. Phys. 38 [9A] (1999) 5224-5226. https://doi.org/10.1143/JJAP.38.5224
  6. G. Mei-Zhen, R. JOB, X. De-Sheng and W.R. Fahrner, Chinise phys. lett. 25 [4] (2008) 1380-1383. https://doi.org/10.1088/0256-307X/25/4/059
  7. J.H. Lee, H.K. Jung, J.G. Lee, D.G. Lim, K.J. Yang, J.S. Yi and W.C. Song, Thin Solid Films. 516 [7] (2008) 1634-1639. https://doi.org/10.1016/j.tsf.2007.05.028
  8. M. Boehme and C. Charton, Surf. Coat. Technol. 200 [1-4] (2005) 932-935. https://doi.org/10.1016/j.surfcoat.2005.02.040
  9. J. Goree and T. E. Sheridan, Appl. Phys. Lett. 59[9](1991)1052-1054. https://doi.org/10.1063/1.106342
  10. P.K. Song, Y. Shigesato, M. Kamei and I. Yasui, Jpn. J. Appl. Phys. 3 [5A] (1999) 2921-2927.
  11. P.K. Song, Y. Irie, S. Ohno, Y.Sato and Y.Shigesato, Jpn. J. Appl. Phys. 43 [4A] (2004) L442-L445. https://doi.org/10.1143/JJAP.43.L442
  12. Y. Hoshi and R. Ohki, Electrochimica Acta. 44 [21-22] (1999) 3927-3932. https://doi.org/10.1016/S0013-4686(99)00100-0
  13. Z.W. Yang, S.H. Han, T.L. Yang, Lina Ye, D.H. Zhang, H.L. Ma and C.F. Cheng, Thin Solid Films. 366 [1-2] (2000) 4-7. https://doi.org/10.1016/S0040-6090(00)00919-6
  14. Y. Shigesato and D. Paine, Thin Solid Films. 238 [1] (1994) 44-50. https://doi.org/10.1016/0040-6090(94)90646-7
  15. O. Kamiya, Y. Onai, H. Kato and Y. Hoshi, J. Mater. Sci. -Mater. Electron. 18 [1] (2007) 359-362. https://doi.org/10.1007/s10854-007-9240-6
  16. D. Vaufrey, M. B. Khalifa, J. Tardy, C. Ghica, M. G. Blanchin, C. Sandu and J. A. Roger. Semicond, Sci. Technol. 18 [4] (2003) 253-260. https://doi.org/10.1088/0268-1242/18/4/310
  17. Y. Hoshi and T. Kiyomura, Thin Solid Films. 411 [1] (2002) 36-41. https://doi.org/10.1016/S0040-6090(02)00170-0
  18. P.K. Song, M. Yamagishi, H. Odaka, Y. Shigesato. Jpn. J. Appl. Phys. 42 [12B] (2003) 1529-1531. https://doi.org/10.1143/JJAP.42.L1529
  19. J.H. Lee, H.K. Jung, J.G. Lee, D.G. Lim, K.J Yang, J.S Yi, W.C Song. Thin Solid Films. 516 (2008) 1634-1639. https://doi.org/10.1016/j.tsf.2007.05.028