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Non-HF Type Etching Solution for Slimming of Flat Panel Display Glass

평판디스플레이용 유리의 박판화공정을 위한 비불산형 식각액

  • Lee, Chul-Tae (Department of Chemical Engineering, Dankook University)
  • Received : 2016.01.13
  • Accepted : 2016.01.14
  • Published : 2016.02.10

Abstract

The purpose of this research was to develop a flat panel display device's glass etchant which can replace hydrofluoric acid. The glass etchant was composed of 18~19% wt% of ammonium hydrogen fluoride, 24~25 wt% of sulfuric acid, 45~46 wt% of water, 4~5 wt% of sulfate and 7~8 wt% of fluoro-silicate. By replenishing the etchant which has the amount of 5% of initial solution's mass, it was possible to reuse the etchant continuously. The developed etchant showed $5{\mu}m/min$ of etching rate at $30^{\circ}C$. The reusable etchant, with replenishing 5% of initial etchant mass showed the stable etching rate, which has the deviation of less than $0.1{\mu}m/min$ etching rate. The glass surface of flat panel display device created from our etching process was in good condition with any defects such as pin hole and dimple.

기존의 불산을 대체할 수 있는 평판디스플레이용 유리의 식각용액을 개발하고자 진행하였다. 본 연구과정을 통해 제안된 불산 대체 유리 식각용액은 산성불화암모늄 18~19 wt%, 황산 24~25 wt%, 물 45~46 wt%, 황산염 4~5 wt%, 규불화염 7~8 wt%로 구성되며, 사용된 식각용액의 재사용 시 보충용액으로서 해당조성의 식각용액을 전체의 5% 되게 보충함으로서 효과적으로 지속적으로 재사용이 가능하다. 개발된 식각용액은 $30^{\circ}C$에서 $5{\mu}m/min$ 이상의 식각속도를 나타내며, 반복 재사용 시에도 초기 식각액 전체 질량의 5% 추가로 보충함으로서 식각속도는 $0.1{\mu}m/min$ 이하로 편차로 식각속도가 안정적으로 유지되었다. 이 식각공정을 통해 얻어진 평판디스플레이용의 유리의 표면 상태는 Pin hole, Dimple 등이 발견되지 않는 양호한 품질을 나타내었다.

Keywords

References

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Cited by

  1. 불규칙 패턴 에칭에 의한 표면 형상 제어와 광학적 특성 vol.30, pp.12, 2016, https://doi.org/10.4313/jkem.2017.30.12.800