References
- J. R. McNeal, A. C. Barron, S. R. Wilson, and W. C. Herrmann, 'Ion Assist Deposition of Optical Thin Films : Low Energy vs High Energy Bombardent,' Appl. Opt., 23 552-59 (1984) https://doi.org/10.1364/AO.23.000552
-
H. J. Cho, H. S. Lee, C. K. Hwangbo, M. H. Lee, and D. Y. Park, 'Optical Properties of
$TiO_2 $ Thin Films Prepared by Ion-Beam Assisted Deposition,' J. Opt. Soc. Kor., 5 9-17 (1993) -
S. G. Yoon, H. K. Kim, G. Y. Kim, M. J. Kim, H. M. Lee, S. H Lee, C. K. Hwangbo, and D. H. Yoon, 'Characteristics Analysis and Manufacture of
$Ta_2O_5$ Thin Films Prepared by Dual Ion-Beam Sputtering Deposition with Change of Ar/$O_2$ Gas Flow Ratio of Assist Ion Beam,' J. Kor. Ceram. Soc., 40 [12] 1165-69 (2003) https://doi.org/10.4191/KCERS.2003.40.12.1165 - F. Flory, E. Pelletier, G. Albrand, and Y. Hu, 'Surface Optical Coating by Ion Assisted Deposition Techniques : Study of Uniformity,' Appl. Opics., 28 2952-57 (1989) https://doi.org/10.1364/AO.28.002952
- J. A. Thornton, 'Infurence of Apparatus Geometry and Deposition Conditions on the Structure and Topography of Thick Sputtered Coating,' J. Vac. Sci. Tech., 11 666-69 (1974) https://doi.org/10.1116/1.1312732
-
M. Lottiaux, 'Morphology and Structure of
$TiO_2$ Thin Layers Versus Thickness and Substrate Temperature,' Thin Solid Films, 170 107-26 (1989) https://doi.org/10.1016/0040-6090(89)90627-5 -
Y. Zhao, Y. Wang, H. Gong, J. Shao, and Z. Fan 'Annealing Effect on the Structure and Laser-Induced Damage Threshold of
$Ta_2O_5/SiO_2$ Dielectric Mirrors,' Appl. Surf. Sci., 210 353-58 (2003) https://doi.org/10.1016/S0169-4332(03)00153-3 -
Y. Fujiwara, N. Toyoda, K. Mochiji, T. Mitamura, and I. Yamada, 'Reduction of Surface Roughness by
$Ta_2O_5$ , Film Formation with$O_2$ Cluster Ion Assisted Deposition,' Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 206 870-74 (2003) https://doi.org/10.1016/S0168-583X(03)00881-4 -
Y. Song, T. Sakurai, K. Maruta, A. Matusita, S. Matsumoto, S. Saisho, and K. Kikuchi, 'Optical and Structural Properties of Dense
$SiO_2$ ,$Ta_2O_5$ and$Nb_2O_5$ Thin-Films Deposited by Indirectly Reactive Sputtering Technique,' Vacuum, 59 755-63 (2000) https://doi.org/10.1016/S0042-207X(00)00344-4 -
S. D. Cho and K. W. Paik, 'Study on the Amorphous
$Ta_2O_5$ Thin Film Capacitors Deposited by D.C. Magnetron Reactive Sputtering for Multichip Module Applications,' Mater. Sci. and Eng. B, 67 108-12 (1999) https://doi.org/10.1016/S0921-5107(99)00330-X - H. R. Kaufman, J. J. Cuomo, and M. E. Harper, 'Technology and Applications Broad-Beam Ion Sources Used in Sputtering,' J. Vac. Sci. Tech., 21 725-29 (1982) https://doi.org/10.1116/1.571819
- G. G. Stoney, 'The Tension of Matallic Films Deposited by Electrolysis,' Proc. R. Soc. London Ser., A 82 1729 (1909)
- C. A. Davis, 'A Simple Model for the Formation of Compressive Stress in Thin Films by Ion Bombardment,' Thin solid Films, 226 30-4 (1993) https://doi.org/10.1016/0040-6090(93)90201-Y
-
C. C. Lee, C. L. Tien, and J. C. Hsu, 'Internal Stress and Optical Properties of
$Nb_2O_5$ , Thin Films Deposited by Ionbeam Sputtering,' Appl. Opt., 41 2043-47 (2002) https://doi.org/10.1364/AO.41.002043