Electrical characteristics and efficiency of organic light-emitting diodes depending on hole-injection layer

Lee, Y.H.;Kim, W.J.;Kim, T.Y.;Jung, J.;Lee, J.Y.;Park, H.D.;Kim, T.W.;Hong, J.W.

  • Published : 20070500

Abstract

In a device structure of ITO/hole-injection layer/N,N0-biphenyl-N,N0-bis-(1-naphenyl)-[1,10-biphthyl]4,40-diamine(NPB)/tris(8-hydroxyquinoline)aluminum(Alq3)/Al, we investigated the eect of the hole-injection layer on the electrical characteristics and externalquantum eciency of organic light-emitting diodes. Thermal evaporation was performed to make a thickness of NPB layer with a rate of0.51.0 A˚/s at a base pressure of 5· 10. 6 Torr. We measured currentvoltage characteristics and external quantum eciency with asuch as good mechanical junction, reducing the operating voltage, and energy band adjustment. Compared with devices without ahole-injection layer, we found that the optimal thickness of NPB was 20 nm in the device structure of ITO/NPB/Alq3/Al. By using aCuPc or PVK buer layer, the external quantum eciencies of the devices were improved by 28.9% and 51.3%, respectively.

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References

  1. G.B. Blanchet, Y.L. Loo, J.A. Rogers, F. Gao, C.R. Fincher, Appl. Phys. Lett. 82 (2003) 463 https://doi.org/10.1063/1.1533110
  2. H.E.A. Huitema, G.H. Gelinck, J.B.P.H. Putten, K.E. Kuijk, K.M. Hart, E. Cantatore, D.M. Leeuw, Adv. Mater. 14 (2002) 1201 https://doi.org/10.1002/1521-4095(20020903)14:17<1201::AID-ADMA1201>3.0.CO;2-5
  3. L.S. Hung, C.H. Chen, Mater. Sci. Eng. R 39 (2002) 143 https://doi.org/10.1016/S0927-796X(02)00093-1
  4. M. Pope, H.P. Kallmann, P. Magnante, J. Chem. Phys. 38 (1963) 2042 https://doi.org/10.1063/1.1733929
  5. J.H. Burroughes, D.D.C. Bradley, A.R. Brown, R.N. Marks, K. Mackay, R.H. Friend, P.L. Burns, A.B. Holmes, Nature 347 (1990) 539 https://doi.org/10.1038/347539a0
  6. K. Kuro, Current Appl. Phys. 5 (2005) 337 https://doi.org/10.1016/j.cap.2003.11.095
  7. C. Jiang, W. Yang, J. Peng, S. Xiao, Y. Cao, Adv. Mater. 16 (2004) 537 https://doi.org/10.1002/adma.200306331
  8. H.S. Lee, W.J. Lee, K.W. Jang, M.K. Choi, S.I. Lee, T.W. Kim, M. Iwamoto, J.U. Lee, J. KIEEME 17 (2004) 196