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The Calculation of Two Dimensional Spatial Profile of Electromagnetic Field for Capacitively Coupled Plasma Source

축전 결합형 플라즈마원에 대한 전자기장의 2차원 공간 의존성 계산

  • Kim, Y.I. (Department of electrical engineering, Chungbuk National University) ;
  • Yoon, N.S. (Department of electrical engineering, Chungbuk National University)
  • Published : 2008.09.30

Abstract

In this study, Two dimensional spatial profile of electromagnetic field for capacitively coupled plasma source is calculated. Based on one dimensional fluid equation, spatial profile for the axial direction of electric field and conduction current density is firstly calculated. The two dimensional spatial profile for the electromagnetic field is calculated from solution of Maxwell equation that is expanded to power series for ${\omega}r/c$ into the radial direction.

본 연구에서는 축전 결합형 플라즈마원에 대한 전자기장의 2차원 공간 의존성을 계산하였다. 1차원 유체 방정식을 기반으로 축전 전기장과 전도 전류 밀도의 axial 방향 공간 의존성을 계산한 후, radial 방향으로는 맥스웰 방정식의 해를 ${\omega}r/c$에 대한 power series로 전개하여 전자기장의 2차원 공간 의존성을 계산하였다.

Keywords

References

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