References
- S. Kamiya, H. Furuta, and M. Omiya, Surf. Coat. Technol. 202, 1084 (2007). https://doi.org/10.1016/j.surfcoat.2007.07.061
- F. Barlow, A. Lostetter, and A. Elshabini, Microelectron. Reliab. 42, 1091 (2002). https://doi.org/10.1016/S0026-2714(02)00061-6
- E. Liston, L. Martinu, and M. Wertheimer, J. Adhes. Sci. Technol. 7, 1091 (1993). https://doi.org/10.1163/156856193X00600
- J. Y. Song and J. Yu, Acta mater. 50, 3985 (2002). https://doi.org/10.1016/S1359-6454(02)00197-0
- S. H. Kim, S. W. Na, N. E. Lee, Y. W. Nam, and Y. H. Kim, Surf. Coat. Technol. 200, 2072 (2005). https://doi.org/10.1016/j.surfcoat.2005.05.021
- Y. B. Park, I. S. Park, and J. Yu, Mater. Sci. Eng. A 266, 261 (1999). https://doi.org/10.1016/S0921-5093(98)01117-4
- T. Miyamura and J. Koike, Mater. Sci. Eng. A. 445-446, 620 (2007). https://doi.org/10.1016/j.msea.2006.09.097
- L. P. Buchwalter and K. Holloway, J. Adhes. Sci. Technol. 12, 95 (1998). https://doi.org/10.1163/156856198X00678
- K. J. Min, M. H. Jeong, K. H. Lee, Y. S. Jeong, and Y. B. Park, J. Kor. Inst. Met. & Mater. 47, 675 (2009).
- J. L. Jordan, P. N. Sanda, J. F. Morar, C. A. Kovac, F. J. Himpsel, and R. A. Pollak, J. Vac. Sci. Technol. A 4, 1046 (1986). https://doi.org/10.1116/1.573451
- J. S. Eom and S. H. Kim, Thin Solid Films 516, 4530 (2008). https://doi.org/10.1016/j.tsf.2008.01.022
- R. Haight, R. C. White, B. D. Silverman, and P. S. Ho, J. Vac. Sci. Technol. A 6, 2188 (1988). https://doi.org/10.1116/1.575010
- N. J. Chou, D. W. Dong, J. Kim, and A. C. Liu, J. Electrochem. Soc. 131, 2335 (1984). https://doi.org/10.1149/1.2115252
- M. I. Birjega, C. A. Constantin, I. T. Florescu, and C. Sarbu, Thin Solid Films 92, 315 (1982). https://doi.org/10.1016/0040-6090(82)90154-7
- S. Schiller, U. Heisig, K. Goedicke, and H. Bilz, Thin Solid Films 119, 211 (1984). https://doi.org/10.1016/0040-6090(84)90536-4
- I. S. Park and J. Yu, Acta mater. 46, 2947 (1998). https://doi.org/10.1016/S1359-6454(97)00208-5
- B. I. Noh and S. B. Jung, J. Electron. Mater. 38, 46 (2009). https://doi.org/10.1007/s11664-008-0543-z
- B. I. Noh, J. W. Yoon, B. Y. Lee, and S. B. Jung, J. Mater. Sci. Mater. Electron. 20, 885 (2009). https://doi.org/10.1007/s10854-008-9811-1
Cited by
- Effect of Interfacial Microstructures on the Bonding Strength of Sn-3.0Ag-0.5Cu Pb-Free Solder Bump vol.51, pp.5, 2010, https://doi.org/10.7567/jjap.51.05ee06
- Effects of surface finishes and loading speeds on shear strength of Sn–3.0Ag–0.5Cu solder joints vol.89, pp.None, 2010, https://doi.org/10.1016/j.mee.2011.03.148
- 초박형 FPCB의 유연 내구성 연구 vol.21, pp.4, 2010, https://doi.org/10.6117/kmeps.2014.21.4.069
- Effects of microcrack evolution on the electrical resistance of Cu thin films on flexible PI substrates during cyclic-bend testing vol.23, pp.4, 2010, https://doi.org/10.1007/s12540-017-6735-4
- Electro-mechanical Degradation Model of Flexible Metal Films Due to Fatigue Damage Accumulation vol.26, pp.4, 2020, https://doi.org/10.1007/s12540-019-00351-x