Journal of Industrial and Engineering Chemistry

The Korean Society of Industrial and Engineering Chemistry (한국공업화학회)
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Preparation of $TiO_2$ thin films on glass beads by a rotating plasma reactor

  • Kim, Dong-Joo (Department of Chemical Engineering, Kangwon National University) ;
  • Kang, Jin-Yi (Department of Chemical Engineering, Kangwon National University) ;
  • Kim, Kyo-Seon (Department of Chemical Engineering, Kangwon National University)
  • Received : 2009.12.01
  • Accepted : 2010.04.26
  • Published : 2010.11.25
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Abstract

We experimentally coated the $TiO_2$ thin films on the glass beads by a rotating cylindrical plasma chemical vapor deposition (PCVD) process. The precursors for the thin films were generated by the plasma reactions, and they deposited on the glass beads to become the grains on the films. The $TiO_2$ thin films grow more quickly on the glass beads by increasing the reactor pressure, or the rotation speed of the reactor. As the applied power increases, the thickness of the thin films on the glass beads decreases. As the thickness of the $TiO_2$ thin films increases, the uniformity of the $TiO_2$ thin films decreases due to the deposition of larger grains or due to the increase of crack size. The rotating cylindrical PCVD process can be a good method to prepare the particles coated with metal or organic-doped thin films for highly functionalized materials.

Keywords

References

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