DOI QR코드

DOI QR Code

Oxidation Process for the Etching Solution Regeneration of Ferric Chloride Using Liquid and Solid Oxidizing Agent

염화철 에칭 용액 재생을 위한 액상 및 고상 산화제를 이용한 산화공정에 대한 연구

  • Kim, Dae-Weon (Advanced Materials and Processing Center, Institute for Advanced Engineering (IAE)) ;
  • Park, Il-Jeong (Advanced Materials and Processing Center, Institute for Advanced Engineering (IAE)) ;
  • Kim, Geon-Hong (Advanced Materials and Processing Center, Institute for Advanced Engineering (IAE)) ;
  • Chae, Byung-man (KMC CO., LTD.) ;
  • Lee, Sang-Woo (KMC CO., LTD.) ;
  • Choi, Hee-Lack (Division of Materials Science and Engineering, Pukyong University) ;
  • Jung, Hang-Chul (Advanced Materials and Processing Center, Institute for Advanced Engineering (IAE))
  • Received : 2016.12.07
  • Accepted : 2017.01.18
  • Published : 2017.06.30

Abstract

$FeCl_3$ solution has been used as an etchant for metal etching such as Fe, Cu, Al and Ni. In the etching process, $Fe^{3+}$ is reduced to $Fe^{2+}$ and the etching efficiency is decreased. Waste $FeCl_3$ etchant has environmental, economic problems and thus the regeneration of the etching solution has been required. In this study, HCl was mixed with the $FeCl_2$ solution and then, $H_2O_2$, $NaClO_3$ were added into the mixed solution to oxidize the $Fe^{2+}$. During the oxidation process, oxidation-reduction potential (ORP) was measured and the relationship between ORP and oxidation ratio was investigated. The ORP is increased with increasing the concentration of $H_2O_2$ and $NaClO_3$, and then the ORP is decreased with oxidation progress. Such a behavior was in good agreement with Nernst's equation. Also, the oxidation efficiency was about 99% when a sufficient amount of HCl and $H_2O_2$, $NaClO_3$ were added.

철, 구리, 알루미늄, 니켈 등의 금속을 에칭하기 위한 에칭액으로 $FeCl_3$ 용액이 사용되며, 에칭 과정에서 $Fe^{3+}$$Fe^{2+}$로 환원되면서 에칭속도를 저하시키고, 에칭효율이 감소하게 된다. 또한 에칭 후 발생하는 염화철 에칭폐액은 환경적, 경제적으로 문제를 지니기 때문에 에칭액을 재생하여 재사용 할 필요가 있다. 본 연구에서는 $FeCl_2$ 용액에 HCl을 첨가한 후, 산화제로 $H_2O_2$, $NaClO_3$를 첨가하여 용액 내 $Fe^{2+}$를 산화시켰으며, 산화과정에서 산화-환원전위(ORP)와 산화율간의 관계를 조사하였다. ORP는 $H_2O_2$$NaClO_3$의 농도가 증가함에 따라 증가하였으며, 산화가 진행되면서 점차 감소하여 산화가 완료된 후에 일정한 ORP를 유지하였다. Nernst 식과 일치하는 결과를 보였다. 또한 충분한 양의 HCl 및 $H_2O_2$, $NaClO_3$를 첨가하였을 경우, 약 99% 이상 산화가 이루어짐을 알 수 있었다.

Keywords

References

  1. Lee, H. M., Park, M., Park, G. H., and Park, C., "Wet Etching of Stainless Steel Foil by Aqueous Ferric Chloride Solution," Korean Chem. Eng. Res., 50(2), 211-216 (2012). https://doi.org/10.9713/kcer.2012.50.2.211
  2. Allen, D. M., and Ler, L. T., "Increasing Utilisation Efficiency of Ferric Chloride Etchant in Industrial Photochemical Machining," J. Environ. Monit., 1, 103-108 (1999). https://doi.org/10.1039/a808158a
  3. Lee, H., Ahn, E., Park, C., and Tak, Y., "Regenration of Waste Ferric Chloride Etchant HCl and $H_2O_2$," Appl. Chem. Eng., 24(1), 67-71 (2013).
  4. Ler, L. T., "Oxygen as a Potential Etchant Regenerator," MS Dissertation, Cranfield Institute of Technology, Bedford (1993).
  5. Allen, D. M., and Ler, L. T., "The Potential for Oxygen Regeneration of Spent Ferric Chloride Etchant Solutions," PCMI J., 59, 3-7 (1995).
  6. Ler, L. T., "Measurement and Reduction of the Environmental Impact of Industrial Photochemical Maching," Ph.D. Dissertation, Cranfield Institute of Technology, Bedford (1998).
  7. Peter, A., "Automated Oxygen Regeneration of Ferric Chloride Etchant," Ph.D. Dissertation, Cranfield Institute of Technology, Bedford (1999).
  8. Allen, D. M., and Almond, H. J. A., "Characterisation of Aquous Ferric Chloride Etchants Used in Industrial Photochemical Machining," J. Mater. Process Technol., 149, 238-245 (2004). https://doi.org/10.1016/j.jmatprotec.2004.02.044
  9. Yoo, K., Jha, M. K., Kim, M. S., Yoo, J. M., Jeong, J., and Lee, J. C., "Separation of Ni and Fe from $H_2SO_4$ Leaching Solution of Scrapped Fe-Ni Alloy," J. Korean Inst. Resour. Recycl., 17(1), 80-87 (2008).

Cited by

  1. 자동액관리 시스템을 이용한 SUS MASK 에칭에 관한 연구 vol.14, pp.4, 2021, https://doi.org/10.17661/jkiiect.2021.14.4.323