Properties of TiN Thin Films Deposited by ALD Using TDMAT Precursor in Low-Temperature Processes
| No | 이름 | 이메일 | 기관 |
|---|---|---|---|
| 1 | Kyu-Min Park | - | Department of Electrical and Electronics Engineering, Myongji University |
| 2 | Gyu-Jin Mun | - | Department of Semiconductor Engineering, Myongji University |
| 3 | Ji-Hun Cho | - | Department of Electrical and Electronics Engineering, Myongji University |
| 4 | Si-Woo Lee | - | Department of Electrical and Electronics Engineering, Myongji University |
| 5 | Gyeong-Jin Min | - | Department of Semiconductor Engineering, Myongji University |
| 6 | Sang-Jeen Hong | - | Department of Semiconductor Engineering, Myongji University |