Journal of the Korean institute of surface engineering (한국표면공학회지)

The Korean Institute of Surface Engineering (한국표면공학회)
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Properties of Nitrogen and Aluminum Codoped ZnO Thin Films Grown by Radio-frequency Magnetron Sputtering

라디오파 마그네트론 스퍼터링으로 성장한 질소와 알루미늄 도핑된 ZnO 박막의 특성

  • Cho, Shin-Ho (Department of Electronic Materials Engineering, Silla University) ;
  • Cho, Seon-Woog (Department of Electronic Materials Engineering, Silla University)
  • 조신호 (신라대학교 공과대학 전자재료공학과) ;
  • 조선욱 (신라대학교 공과대학 전자재료공학과)
  • Published : 2008.08.31
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Abstract

Nitrogen and aluminum codoped ZnO(NAZO) thin films were grown on glass substrates with changing the nitrogen flow ratio by radio-frequency magnetron sputtering. The structural, optical, and electrical properties of the NAZO films were investigated. The surface morphologies and the structural properties of the thin films were analyzed by using the X-ray diffraction and scanning electron microscopy. The NAZO thin film, deposited at nitrogen flow ratio of 0%, showed a strongly c-axis preferred orientation and the lowest resistivity of $3.2{\times}10^{-3}{\Omega}cm$. The intensity of ZnO(002) diffraction peak was decreased gradually with increasing the nitrogen flow ratio. The optical properties of the films were measured by UV-VIS spectrophotometer and the optical transmittances for all the samples were found to be an average 90% in the visible range. Based on the transmittance value, the optical bandgap energy for the NAZO thin film deposited at nitrogen flow ratio of 0% was determined to be 3.46 eV. As for the electrical properties, the carrier concentration and the hall mobility were decreased, but the electrical resistivity was increased as the nitrogen flow ratio was increased.

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